Please note! Course description is confirmed for two academic years, which means that in general, e.g. Learning outcomes, assessment methods and key content stays unchanged. However, via course syllabus, it is possible to specify or change the course execution in each realization of the course, such as how the contact sessions are organized, assessment methods weighted or materials used.
LEARNING OUTCOMES
After having passed this course the student knows the basic thin film processing methods by using vacuum technology, the basic thin films structure and property characterization methods. The student is familiar with the dependence of thin films structure and properties to the critical coating parameters. The student can select the most potential methods to produce thin films for wanted applications.
Credits: 5
Schedule: 12.01.2021 - 26.02.2021
Teacher in charge (valid 01.08.2020-31.07.2022): Jari Koskinen
Teacher in charge (applies in this implementation): Jari Koskinen
Contact information for the course (applies in this implementation):
CEFR level (applies in this implementation):
Language of instruction and studies (valid 01.08.2020-31.07.2022):
Teaching language: English
Languages of study attainment: English
CONTENT, ASSESSMENT AND WORKLOAD
Content
Valid 01.08.2020-31.07.2022:
Principles of vacuum technology, surface physics and surface-ion interactions and low pressure plasma. Thin film methods: Physical vapor deposition, chemical vapor deposition, and other plasma. Characterization methods for thin films to determine, structure, composition, and mechanical and optical properties.
Assessment Methods and Criteria
Valid 01.08.2020-31.07.2022:
Lectures, active exercises and student presentations during contact sessions, examination.
Workload
Valid 01.08.2020-31.07.2022:
5 cr
Contact teaching
Self-study for exercises
Preparation of exam
DETAILS
Study Material
Valid 01.08.2020-31.07.2022:
Handouts, training material. Murarka, S.P.: Metallization, Theory and Practice for VLSI and ULSI, Butterworth-Heinemann, 1993. Mahan, J.E.: Physical Vapor Deposition of Thin Films, John Wiley & Sons, 2000. Smith, D.L.: Thin-film deposition: principles and practice, McGraw-Hill, 1995. J.L. Vossen & W. Kern (eds.): Thin Film Processes II, Academic Press, 1991. Ohring, M.: The Materials Science of Thin Films, Academic Press, 1992.
Prerequisites
Valid 01.08.2020-31.07.2022:
Recommended CHEM-E5XXX Surfaces and Films and CHEM-E5140 Materials Characterization, laboratory course
SDG: Sustainable Development Goals
3 Good Health and Well-being
7 Affordable and Clean Energy
9 Industry, Innovation and Infrastructure
11 Sustainable Cities and Communities
13 Climate Action
- Teacher: Koskinen Jari
- Teacher: Liljeström Touko