Laajuus: 5

Aikataulu: 24.02.2016 - 31.03.2016

Vastuuopettaja (voimassa 01.08.2018-31.07.2020): 

Jari Koskinen

Opetusperiodi (voimassa 01.08.2018-31.07.2020): 

III

Osaamistavoitteet (voimassa 01.08.2018-31.07.2020): 

After having passed this course the student knows the basic thin film processing methods by using vacuum technology, the basic thin films structure and property characterization methods. The student is familiar with the dependence of thin films structure and properties to the critical coating parameters. The student can select the most potential methods to produce thin films for wanted applications.

Sisältö (voimassa 01.08.2018-31.07.2020): 

Principles of vacuum technology, surface physics and surface-ion interactions and low pressure plasma. Thin film methods: Physical vapor deposition, chemical vapor deposition, and other plasma. Characterization methods for thin films to determine, structure, composition, and mechanical and optical properties.

Toteutus, työmuodot ja arvosteluperusteet (voimassa 01.08.2018-31.07.2020): 

Lectures, active exercises and student presentations during contact sessions, examination.

Työmäärä toteutustavoittain (voimassa 01.08.2018-31.07.2020): 

5 cr = 135 h 

Contact teaching 24 h 

Self-study for exercises 78 h 

Preparation of exam 30 h + 3 h

Oppimateriaali (voimassa 01.08.2018-31.07.2020): 

Handouts, training material. Murarka, S.P.: Metallization, Theory and Practice for VLSI and ULSI, Butterworth-Heinemann, 1993. Mahan, J.E.: Physical Vapor Deposition of Thin Films, John Wiley & Sons, 2000. Smith, D.L.: Thin-film deposition: principles and practice, McGraw-Hill, 1995. J.L. Vossen & W. Kern (eds.): Thin Film Processes II, Academic Press, 1991. Ohring, M.: The Materials Science of Thin Films, Academic Press, 1992.

Korvaavuudet (voimassa 01.08.2018-31.07.2020): 

MT-0.6021 Fundamentals of Vacuum Technology, Thin Films and Metallurgical Coatings (3 cr), MT-0.6067 Thin Film Technology (5 cr)

Kurssin kotisivu (voimassa 01.08.2018-31.07.2020): 

https://mycourses.aalto.fi/course/search.php?search=CHEM-E5125

Esitiedot (voimassa 01.08.2018-31.07.2020): 

Recommended CHEM-E5100 Solid State Materials and Phenomena and CHEM-E5140 Materials Characterization, laboratory course

Arvosteluasteikko (voimassa 01.08.2018-31.07.2020): 

Fail, 1 - 5.

Ilmoittautuminen (voimassa 01.08.2018-31.07.2020): 

WebOodi

Students chosen to this course are primarily major students of Functional Materials. If more than 20 students enroll to this course, the number of course participants can be limited. All major students are, however, chosen to the course if enrolled in time.

Lisätietoja (voimassa 01.08.2018-31.07.2020): 

Students chosen to this course are primarily major students of Functional Materials. If more than 20 students enroll to this course, the number of course participants can be limited. All major students are, however, chosen to the course if enrolled in time.

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