Please note! Course description is confirmed for two academic years (1.8.2018-31.7.2020), which means that in general, e.g. Learning outcomes, assessment methods and key content stays unchanged. However, via course syllabus, it is possible to specify or change the course execution in each realization of the course, such as how the contact sessions are organized, assessment methods weighted or materials used.

LEARNING OUTCOMES

After having passed this course the student knows the basic thin film processing methods by using vacuum technology, the basic thin films structure and property characterization methods. The student is familiar with the dependence of thin films structure and properties to the critical coating parameters. The student can select the most potential methods to produce thin films for wanted applications.

Credits: 5

Schedule: 12.01.2021 - 26.02.2021

Teacher in charge (valid 01.08.2020-31.07.2022): Jari Koskinen

Teacher in charge (applies in this implementation): Jari Koskinen

Contact information for the course (applies in this implementation):

CEFR level (applies in this implementation):

Language of instruction and studies (valid 01.08.2020-31.07.2022):

Teaching language: English

Languages of study attainment: English

CONTENT, ASSESSMENT AND WORKLOAD

Content
  • Valid 01.08.2020-31.07.2022:

    Principles of vacuum technology, surface physics and surface-ion interactions and low pressure plasma. Thin film methods: Physical vapor deposition, chemical vapor deposition, and other plasma. Characterization methods for thin films to determine, structure, composition, and mechanical and optical properties.

Assessment Methods and Criteria
  • Valid 01.08.2020-31.07.2022:

    Lectures, active exercises and student presentations during contact sessions, examination.

Workload
  • Valid 01.08.2020-31.07.2022:

    5 cr

    Contact teaching

    Self-study for exercises

    Preparation of exam

DETAILS

Study Material
  • Valid 01.08.2020-31.07.2022:

    Handouts, training material. Murarka, S.P.: Metallization, Theory and Practice for VLSI and ULSI, Butterworth-Heinemann, 1993. Mahan, J.E.: Physical Vapor Deposition of Thin Films, John Wiley & Sons, 2000. Smith, D.L.: Thin-film deposition: principles and practice, McGraw-Hill, 1995. J.L. Vossen & W. Kern (eds.): Thin Film Processes II, Academic Press, 1991. Ohring, M.: The Materials Science of Thin Films, Academic Press, 1992.

Prerequisites
  • Valid 01.08.2020-31.07.2022:

    Recommended CHEM-E5XXX Surfaces and Films and CHEM-E5140 Materials Characterization, laboratory course

SDG: Sustainable Development Goals

    3 Good Health and Well-being

    7 Affordable and Clean Energy

    9 Industry, Innovation and Infrastructure

    11 Sustainable Cities and Communities

    13 Climate Action

FURTHER INFORMATION

Description

Registration and further information