CHEM-E5125 - Thin Film Technology D, Lecture, 11.1.2022-25.2.2022

Please note! Course description is confirmed for two academic years, which means that in general, e.g. Learning outcomes, assessment methods and key content stays unchanged. However, via course syllabus, it is possible to specify or change the course execution in each realization of the course, such as how the contact sessions are organized, assessment methods weighted or materials used.

LEARNING OUTCOMES

After having passed this course the student knows the basic thin film processing methods by using vacuum technology, the basic thin films structure and property characterization methods. The student is familiar with the dependence of thin films structure and properties to the critical coating parameters. The student can select the most potential methods to produce thin films for wanted applications.

Credits: 5

Schedule: 11.01.2022 - 25.02.2022

Teacher in charge (valid for whole curriculum period):

Teacher in charge (applies in this implementation): Jari Koskinen

Contact information for the course (applies in this implementation):

CEFR level (valid for whole curriculum period):

Language of instruction and studies (applies in this implementation):

Teaching language: English. Languages of study attainment: English

CONTENT, ASSESSMENT AND WORKLOAD

Content

  • valid for whole curriculum period:

    Principles of vacuum technology, surface physics and surface-ion interactions and low pressure plasma. Thin film methods: Physical vapor deposition, chemical vapor deposition, and other plasma. Characterization methods for thin films to determine, structure, composition, and mechanical and optical properties.

Assessment Methods and Criteria

  • valid for whole curriculum period:

    Lectures, active exercises and student presentations during contact sessions, examination.

Workload

  • valid for whole curriculum period:

    5 cr

    Contact teaching

    Self-study for exercises

    Preparation of exam

DETAILS

Study Material

  • valid for whole curriculum period:

    Handouts, training material. Murarka, S.P.: Metallization, Theory and Practice for VLSI and ULSI, Butterworth-Heinemann, 1993. Mahan, J.E.: Physical Vapor Deposition of Thin Films, John Wiley & Sons, 2000. Smith, D.L.: Thin-film deposition: principles and practice, McGraw-Hill, 1995. J.L. Vossen & W. Kern (eds.): Thin Film Processes II, Academic Press, 1991. Ohring, M.: The Materials Science of Thin Films, Academic Press, 1992.

Substitutes for Courses
Prerequisites
SDG: Sustainable Development Goals

    3 Good Health and Well-being

    7 Affordable and Clean Energy

    9 Industry, Innovation and Infrastructure

    11 Sustainable Cities and Communities

    13 Climate Action

FURTHER INFORMATION

Further Information

  • valid for whole curriculum period:

    Students chosen to this course are primarily major students of Functional Materials. If more than 20 students enroll to this course, the number of course participants can be limited. All major students are, however, chosen to the course if enrolled in time.

    Teaching Period:

    2020-2021 Spring III

    2021-2022 Spring III

    Course Homepage: https://mycourses.aalto.fi/course/search.php?search=CHEM-E5125

    Registration for Courses: In the academic year 2021-2022, registration for courses will take place on Sisu (sisu.aalto.fi) instead of WebOodi.

    Sisu

    Students chosen to this course are primarily major students of Functional Materials. If more than 20 students enroll to this course, the number of course participants can be limited. All major students are, however, chosen to the course if enrolled in time.

Rules of Conduct - Students´ Rights and Responsibilities (in force from 1 August 2020)

Aalto University Code of Academic Integrity and Handling Violations Thereof